Titanium Sputtering Target

Product Details

Our Titanium Sputtering Target is supplied by CNBJTI, manufactured from high-purity commercially pure titanium with purity ranging from 4N (99.99%) to 5N (99.999%), produced in strict accordance with industry standards. Featuring excellent density, uniformity and surface quality, the target can be customized in size, shape (round/planar/tubular), bonding method and purity level according to customer requirements, adapting to various magnetron sputtering, ion sputtering and other PVD coating processes. Combining ultra-high purity, high density, uniform sputtering and low impurity content, our titanium target provides stable and uniform titanium thin film deposition. It is widely used in barrier layers for semiconductor chips, gate/source-drain electrodes for LCD panels, anti-reflection coatings for optical lenses, decorative coatings for hardware parts and other fields. We offer full-process services from material purification, custom processing to bonding and welding, with complete Material Test Reports and inspection certificates available, providing reliable titanium target solutions for your advanced coating processes.

Applicable Standards